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Buffered Oxide Etchants
Buffered Oxide Etchants

Buffered Oxide Etchants

Buffered oxide etchants (BOE) are used commonly used in microfabrication. Their primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). Browse our semiconductor grade Puranal™ products.

Normal etching of SiO2 will deplete the fluroide ion concentration, leading to an etch rate which changes over time. Buffering with NH4F slows the etch rate and results in more polishing of the Si surface.

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AWF 10-88-2-LST SLSI Puranal

Ammonium Fluoride Etching Mixture (17035)

AF 500:1 ULSI Puranal

Ammonium Fluoride Etching Mixture (17043)

AF 90-10 ULSI Puranal

Ammonium Fluoride Etching Mixture (17053)

AWF 560-349-91 ULSI Puranal

Ammonium Fluoride Etching Mixture (17063)

AWF 962-35-3 Puranal

Ammonium Fluoride Etching Mixture (17070)

AWF 602-384-14 LST, SLSI Puranal

Ammonium Fluoride Etching Mixture (17235)

AF 875-125 (BOE 8:1) LST, VLSI Puranal

Ammonium Fluoride Etching Mixture (17249)

AF 500-1 LST ULSI Puranal

Ammonium Fluoride Etching Mixture (17255)

AF 91-9 VLSI Puranal

Ammonium Fluoride Etching Mixture (17256)

AF 970-30 VLSI Puranal

Ammonium Fluoride Etching Mixture (17262)

AWF 40-956-4, XLSI Puranal

Ammonium Fluoride Etching Mixture (17268)

AF 876-124 (7.2:1) LST VLSI Puranal

Ammonium Fluoride Etching Mixture (17269)

AF 30/6 XLSI Puranal

Ammonium Fluoride Etching Mixture (17305)

AWAP 750-200-50 VLSI Puranal

Ammonium Fluoride Etching Mixture (17313)

AF 990-10 (100:1) SLSI Puranal

Ammonium Fluoride Etching Mixture (17316)

AWF 56-933-11 XLSI Puranal

Ammonium Fluoride Etching Mixture (17319)

AF 91-9, ULSI Puranal (BOE 10:1)

Ammonium Fluoride Etching Mixture (17323)

AF 990-10 (100:1) SLSI Puranal

Ammonium Fluoride Etching Mixture (17330)

AF 30/6 LST, SLSI Puranal

Ammonium Fluoride Etching Mixture (17332)

AWF 820-101-79 LST, Puranal (Window Etch with Surfactant)

Ammonium Fluoride Etching Mixture (17364)

AF 986-14 (70:1) LST, SLSI Puranal

Ammonium Fluoride Etching Mixture (17375)

AF 95-5 (20:1) XLSI Puranal

Ammonium Fluoride Etching Mixture (17377)

AF 95-5 (20:1) LST ULSI Puranal

Ammonium Fluoride Etching Mixture (17381)

AF 95-5 (20:1) LST ULSI Puranal

Ammonium Fluoride Etching Mixture (17469)

AFW 68-20(48)-12 MOS Puranal

Ammonium Fluoride Etching Mixture (17567)

AF 875-125 VLSI Puranal 250

Ammonium Fluoride Etching Mixture (17621)

AWF 610-275-115 VLSI Puranal

Ammonium Fluoride Etching Mixture (17674)

AF 90-10 LST VLSI Puranal P

Ammonium Fluoride Etching Mixture (17682)

AWF 612-260-128 (BHF 6:1 Modified) LST, VLSI Puranal

Ammonium Fluoride Etching Mixture (17750)

AF 89-11 (17:2) VLSI Puranal

Ammonium Fluoride Etching Mixture (17772)

AWF 550-413-37 LST VLSI Puranal

Ammonium Fluoride Etching Mixture (17807)

AEW 33-33-33-Puranal (AMS 5)

Ammonium Fluoride Etching Mixture (17995)

AF 91-9 Puranal (Oxide Etch 10/1)

Ammonium Fluoride Etching Mixture (19408)

AWAP 750-200-50 VLSI

Ammonium Fluoride Etching Mixture (21313)

AF 95-5 (20:1) ULSI

Ammonium Fluoride Etching Mixture (21470)

486-56-458 VLSI Puranal

Ammonium Fluoride Etching Mixture FWA (17270)

13:2 VLSI Puranal

Buffered Oxide Etchant (17697)

Puranal

C11-Etch LST (17264)

10-88-2 SLSI Puranal

Etching Mixture AWF (17309)

Puranal

Etching Mixture Electronic Grade (49227)

500-250(65)-250(40) Puranal

Etching Mixture PSF (17673)

AF 990-10 ULSI

Mixed Acid Etchant (21332)

VLSI Puranal 250

Oxide Etch 7:1 Modified (17662)

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