Etchant blends selectively and uniformly remove substrates without damaging underlying layers, critical to wafer manufacturing. Our Etchant Blending expertise ranges from mainstream etchants to the development and manufacture of unique blends for customer-specific applications. These blends benefit from the high-purity levels of our base products.
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Buffered Oxide Etchants
Buffered oxide etchants (BOE) are used commonly used in microfabrication. Their primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). Browse our semiconductor grade Puranal™ products.
Metal etchants for use on silicon devices and other microelectronic applications. Browse our semiconductor grade Puranal™ products.
Selectivity is dependent upon etch formulation, concentration, temperature, and mixing level. Browse our semiconductor grade Puranal™ products.