HydroBlock®
HydroBlock P800TR
HydroBlock® P-Series TR film is a poly-chloro-tri-fluoroethylene homopolymer, high performance barrier film for industrial and electronics applications. It provides outstanding water vapor barrier and excellent chemical resistance with high clarity.
Overview
Specifications
General Information
- Application
- Electronics
- Performance Function
- Chemical Resistance
- Vapor Barrier
- Product Family
- P-Series TR Film
MD / TD
- Dimensional Stability
- ≤ +12%/≤ -12%
- Elongation
- 100 - 150%/200 - 275%
- Modulus, Secant
- 190,000 - 225,000 psi/165,000 - 210,000 psi
- Tear Strength, Graves
- 0.9 lbf/0.9 lbf
- Tensile Strength
- 11,000 - 16,000 psi/6,000 - 7,200 psi
Sampling
- Sample Products
- Yes
Typical Properties
- Crystalline Melting Point
- 412°F
- Haze
- <1%
- Thickness (mm)
- 0.8
- Water Vapor Transmission Rate
- 0.021 gms/100in2/day
- Yield
- 16,420 in2/lb
General Information
- Application
- Electronics
- Performance Function
- Chemical Resistance
- Vapor Barrier
- Product Family
- P-Series TR Film
MD / TD
- Dimensional Stability
- ≤ +12%/≤ -12%
- Elongation
- 100 - 150%/200 - 275%
- Modulus, Secant
- 190,000 - 225,000 psi/165,000 - 210,000 psi
- Tear Strength, Graves
- 0.9 lbf/0.9 lbf
- Tensile Strength
- 11,000 - 16,000 psi/6,000 - 7,200 psi
Sampling
- Sample Products
- Yes
Typical Properties
- Crystalline Melting Point
- 412°F
- Haze
- <1%
- Thickness (mm)
- 0.8
- Water Vapor Transmission Rate
- 0.021 gms/100in2/day
- Yield
- 16,420 in2/lb
- Performance Function : Chemical Resistance|Vapor Barrier
- Application : Electronics
- Tensile Strength : 11,000 - 16,000 psi/6,000 - 7,200 psi
- Tear Strength, Graves : 0.9 lbf/0.9 lbf
- Modulus, Secant : 190,000 - 225,000 psi/165,000 - 210,000 psi
- Elongation : 100 - 150%/200 - 275%
- Dimensional Stability : ≤ +12%/≤ -12%
- Sample Products : Yes
- Yield : 16,420 in2/lb
- Haze : <1%
- Crystalline Melting Point : 412°F
- Water Vapor Transmission Rate : 0.021 gms/100in2/day
- Thickness (mm) : 0.8
- Product Family : P-Series TR Film
Data Sheet
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