Patterning Assistance Materials
Honeywell UVAS™ Polymer
A Silicon-Rich Middle Layer for ArF and KrF Tri-Layer Patterning Applications
General Information
- Application
- BARC
- Etch Selectivity Layers
- Masking Layers
- Brand
- Honeywell
General Information
- Application
- BARC
- Etch Selectivity Layers
- Masking Layers
- Brand
- Honeywell
- Brand : Honeywell
- Application : BARC|Etch Selectivity Layers|Masking Layers