ADVANCED MATERIALS

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As a leading supplier of microelectronic polymers to the semiconductor industry we helped pioneer the spin-on glass technology (SOG) that became an industry standard. Our global research and development centers are backed by extensive in-house tools and unparalleled bench strength and expertise. With other applications in development for the display industry, too, our expertise and capabilities keep expanding.


Focused on industry needs.
We produce polymers to meet your application challenges:

  • Insulation
  • Gap-fill and planarization
  • Light management
  • Chemical doping

Offering solutions including:

  • Anti reflective coatings
  • Dopants
  • Organic fill and planarizing materials
  • Spin-dielectric (SOD)
  • Spin-on glass (SOG)
  • Lithographic and etch patterning enabling materials (dual damascene, high-k metal gate, dual/tri-level patterning)

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Patterning Assistance Materials

Patterning Assistance Materials

Designed to improve and extend photolithography and the plasma etch process in semiconductors, our anti-reflective coatings meet the requirements necessary for patterning of thin film features within state-of-the-art IC devices.
Spin-on Dopant (SOD)

Spin-on Dopant (SOD)

Polymers for n-type buried layer diffusion with industry proven performance in bipolar devices, lower maintenance costs, better control of sheet resistance, and safer to handle.
Spin-on Glass (SOG)

Spin-on Glass (SOG)

Electronic polymers with industry proven performance for metal and poly planarization, overcoat passivation, and gap fill in the manufacture of integrated circuits. They offer high thermal stability and minimal wafer thickness variation.
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