ADVANCED MATERIALS

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Patterning Assistance Materials
Patterning Assistance Materials

Patterning Assistance Materials

Designed to improve and extend photolithography and the plasma etch process in semiconductors, our anti-reflective coatings meet the requirements necessary for patterning of thin film features within state-of-the-art IC devices.

Designed for use in semi-conductor manufacturing

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A silicon-rich BARC for single and dual damascene and other advanced patterning applications

Honeywell DUO™ 193

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